搜索结果: 1-7 共查到“光学工程 EUV”相关记录7条 . 查询时间(0.053 秒)
北京大学高鹏团队突破电镜技术 助力国产EUV光刻机（图）
四维电子能量损失谱技术 EUV光刻机 芯片 电镜技术
2022/4/11
北京大学量子材料科学中心高鹏研究组基于扫描透射电子显微镜发展了四维电子能量损失谱技术，突破了传统谱学手段难以在纳米尺度表征晶格动力学的局限，首次实现了半导体异质结界面处局域声子模式的测量，近日更是被《半导体学报》列为2021年度中国半导体十大研究进展。这项科技成果的诞生，不仅是我国高端科学仪器领域的一个重要突破，更为实现国产EUV光刻机、掌握芯片核心技术、攻克国产半导体核心技术壁垒增添了动力。四维...
2017SPIEX射线/EUV光学器件进展专题会议（Advances in X-Ray/EUV Optics and Components XII）
2017 SPIEX 射线/EUV光学器件进展 专题会议
2017/4/25
2017SPIEX射线/EUV光学器件进展专题会议（Advances in X-Ray/EUV Optics and Components XII）。
2017SPIEX射线和EUV光学计量学进展专题会议（Advances in Metrology for X-Ray and EUV Optics VII）
2017 SPIEX 射线和EUV光学计量学进展 专题会议
2017/4/25
2017SPIEX射线和EUV光学计量学进展专题会议（Advances in Metrology for X-Ray and EUV Optics VII）。
中国科学院上海光学精密机械研究所高功率激光物理联合室实验室张军勇课题组首次将古希腊梯子映射到纳米结构中，以解析的数学形式完整描述了三维阵列焦点成像的方法，通过数论解决了结构设计的初始化问题。
EUV is hot topic at SPIE Advanced Lithography 2011（图）
SPIE EUV Advanced Lithography semiconductor industry
2011/4/21
First noted in 1965, Moore's law describes the trend of increasing computer technology, which has continued for more than 50 years and is expected to keep going for decades more in the semiconductor i...
Laser Produced Plasma for EUV Light Source For Lithography
EUV light Laser produced plasma Light source for tin and xenon plasma
2009/6/8
We describe properties of laser produced plasmas (LPP) for extreme ultra violet (EUV) light source for next generation lithography as an industrial application of LPP. We briefly present three topics ...
Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
laser-produced plasma extreme ultraviolet (EUV) source
2011/5/3
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The ...