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EUV is hot topic at SPIE Advanced Lithography 2011(图)
SPIE EUV Advanced Lithography semiconductor industry
2011/4/21
First noted in 1965, Moore's law describes the trend of increasing computer technology, which has continued for more than 50 years and is expected to keep going for decades more in the semiconductor i...
Community readies for SPIE Advanced Lithography amidst market growth indicators(图)
SPIE semiconductor industry EUV
2011/4/22
Bolstered by a record 2010 and continued indicators predicting market growth for the industry, the lithography community is preparing for its annual gathering at SPIE Advanced Lithography. Finding sol...
Directional Photofluidization Lithography for Nanoarchitectures with Controlled Shapes and Sizes
Surface plasmon resonance metallic nanostructures azopolymer directional photofl uidization
2015/8/10
Highly ordered metallic nanostructures have attracted an increasing interest in nanoscale electronics, photonics, and spectroscopic imaging. However, methods typically used for fabricating metallic na...
Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells
Simplifying Nanosphere Lithography Solar Cells
2008/10/30
A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surfac...